Plasma Thin Film Lab

Anodic Vacuum Arc (Thin film deposition of Copper, Iron, Nickel, Cobalt, Aluminum)

  • Anodic Vacuum Arc system enables high-quality thin film deposition of Copper, Iron, Nickel, Cobalt, and Aluminum under controlled vacuum conditions.
Instrument

Contact Details

Laboratory In-Charge
Dr. Sanat Kumar Mukherjee
Assistant Professor
Department of Physics